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dc.contributor.authorYasuhara, Shigeo
dc.contributor.authorCan, Musa
dc.contributor.authorEndo, Tamio
dc.contributor.authorMatsuda, Akifumi
dc.contributor.authorYoshimoto, Mamoru
dc.contributor.authorKaneko, Satoru
dc.contributor.authorTokumasu, Takashi
dc.contributor.authorNakamaru, Yoshimi
dc.contributor.authorKokubun, Chiemi
dc.contributor.authorKonda, Kayoko
dc.contributor.authorYasui, Manabu
dc.contributor.authorKurouchi, Masahito
dc.contributor.authorShawuti, Shalima
dc.contributor.authorSudo, Rieko
dc.date.accessioned2021-03-04T14:01:07Z
dc.date.available2021-03-04T14:01:07Z
dc.identifier.citationKaneko S., Tokumasu T., Nakamaru Y., Kokubun C., Konda K., Yasui M., Kurouchi M., Can M., Shawuti S., Sudo R., et al., "Constriction of a lattice constant in an epitaxial magnesium oxide film deposited on a silicon substrate", JAPANESE JOURNAL OF APPLIED PHYSICS, cilt.58, 2019
dc.identifier.issn0021-4922
dc.identifier.othervv_1032021
dc.identifier.otherav_7f55f768-3038-404d-94fc-9856f13011cf
dc.identifier.urihttp://hdl.handle.net/20.500.12627/86910
dc.identifier.urihttps://doi.org/10.7567/1347-4065/aaec11
dc.description.abstractWe demonstrated epitaxial growth of magnesium oxide (MgO) on a silicon (Si) substrate with cubic on cubic structure (MgO(001)//Si(001) and MgO(100)//Si(100)]. Epitaxial films were prepared using the pulsed laser deposition method, and with dependent on deposition conditions of oxygen partial pressure and substrate temperature, the lattice constants of MgO decreased along both the surface normal and in-plane directions. To support the facts of (1) constriction of lattice constants and (2) cubic on cubic growth, we show (1) optimal lattice constants with defects in the crystal structure, (2) domain mismatch between MgO and Si instead of lattice mismatch, and (3) stability of MgO crystals on the surface of the Si substrate. (C) 2018 The Japan Society of Applied Physics
dc.language.isoeng
dc.subjectFİZİK, UYGULAMALI
dc.subjectTemel Bilimler
dc.subjectTemel Bilimler (SCI)
dc.subjectFizik
dc.titleConstriction of a lattice constant in an epitaxial magnesium oxide film deposited on a silicon substrate
dc.typeMakale
dc.relation.journalJAPANESE JOURNAL OF APPLIED PHYSICS
dc.contributor.departmentKanagawa Inst Ind Sci & Technol KISTEC , ,
dc.identifier.volume58
dc.contributor.firstauthorID262237


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