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dc.contributor.authorDoty, Matthew F.
dc.contributor.authorCan, Musa Mutlu
dc.contributor.authorHaughn, Chelsea R.
dc.contributor.authorFirat, Tezer
dc.contributor.authorShah, S. Ismat
dc.date.accessioned2021-03-04T12:09:20Z
dc.date.available2021-03-04T12:09:20Z
dc.date.issued2012
dc.identifier.citationCan M. M. , Shah S. I. , Doty M. F. , Haughn C. R. , Firat T., "Electrical and optical properties of point defects in ZnO thin films", JOURNAL OF PHYSICS D-APPLIED PHYSICS, cilt.45, sa.19, 2012
dc.identifier.issn0022-3727
dc.identifier.otherav_75f03b2b-6ad0-4b98-8020-721a1ffcce83
dc.identifier.othervv_1032021
dc.identifier.urihttp://hdl.handle.net/20.500.12627/81000
dc.identifier.urihttps://doi.org/10.1088/0022-3727/45/19/195104
dc.description.abstractWe show that the deposition of ZnO films under varying oxygen partial pressure and annealing conditions allows for the controllable formation of specific defects. Using x-ray diffraction and photoluminescence, we characterize the defects formed and show that these defects are responsible for changes in film carrier density, carrier type, sheet resistivity and mobility.
dc.language.isoeng
dc.subjectTemel Bilimler
dc.subjectFİZİK, UYGULAMALI
dc.subjectFizik
dc.subjectTemel Bilimler (SCI)
dc.titleElectrical and optical properties of point defects in ZnO thin films
dc.typeMakale
dc.relation.journalJOURNAL OF PHYSICS D-APPLIED PHYSICS
dc.contributor.departmentUniversity Of Delaware , ,
dc.identifier.volume45
dc.identifier.issue19
dc.contributor.firstauthorID94324


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