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dc.contributor.authorKing, P. J. C.
dc.contributor.authorCelebi, Yaşar Gürkan
dc.contributor.authorLichti, R. L.
dc.contributor.authorYonenaga, I.
dc.contributor.authorChow, K. H.
dc.contributor.authorCarroll, B. R.
dc.date.accessioned2021-03-03T19:02:19Z
dc.date.available2021-03-03T19:02:19Z
dc.date.issued2010
dc.identifier.citationCarroll B. R. , Lichti R. L. , King P. J. C. , Celebi Y. G. , Yonenaga I., Chow K. H. , "Muonium defect levels in Czochralski-grown silicon-germanium alloys", PHYSICAL REVIEW B, cilt.82, sa.20, 2010
dc.identifier.issn1098-0121
dc.identifier.otherav_525ff250-241f-4aa9-b864-5a83f6c0aa38
dc.identifier.othervv_1032021
dc.identifier.urihttp://hdl.handle.net/20.500.12627/58486
dc.identifier.urihttps://doi.org/10.1103/physrevb.82.205205
dc.description.abstractWe report Muonium (Mu) donor and acceptor levels in Czochralski-grown Silicon Germanium alloys (Cz-Si(1-x)Ge(x)). Measurement of these defect energies provides an analogous examination of Hydrogen defects that are otherwise inaccessible. Temperature-dependent Muonium fractions in several alloy samples (x = 0.20, 0.45, 0.77, 0.81, 0.84, 0.90, 0.91, 0.94, 0.98) show charge-state transitions assigned to Mu donor and acceptor ionizations. Our results indicate a deep Mu donor level across the alloy system. The Mu acceptor level is deep in pure Si and valence-band resonant in pure Ge; we specifically examine the compositional dependence of the Mu(T)(0) acceptor ionization energy in Ge-rich alloys, where this level crosses into the valence band.
dc.language.isoeng
dc.subjectTemel Bilimler
dc.subjectMühendislik ve Teknoloji
dc.subjectFİZİK, YOĞUN MADDE
dc.subjectYoğun Madde 1:Yapısal, Mekanik ve Termal Özellikler
dc.subjectTemel Bilimler (SCI)
dc.subjectFizik
dc.subjectFİZİK, UYGULAMALI
dc.subjectMühendislik, Bilişim ve Teknoloji (ENG)
dc.subjectMalzeme Bilimi
dc.subjectMALZEME BİLİMİ, MULTIDISCIPLINARY
dc.titleMuonium defect levels in Czochralski-grown silicon-germanium alloys
dc.typeMakale
dc.relation.journalPHYSICAL REVIEW B
dc.contributor.departmentTexas Tech University System , ,
dc.identifier.volume82
dc.identifier.issue20
dc.contributor.firstauthorID45957


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