Statistical mechanics of a deposition-diffusion process

dc.contributor.author	Rodgers, GJ
dc.contributor.author	Kartal, Sehban
dc.date.accessioned	2021-03-03T13:21:37Z
dc.date.available	2021-03-03T13:21:37Z
dc.identifier.citation	Kartal S., Rodgers G., "Statistical mechanics of a deposition-diffusion process", PHYSICS LETTERS A, cilt.225, ss.239-244, 1997
dc.identifier.issn	0375-9601
dc.identifier.other	vv_1032021
dc.identifier.other	av_338dbe79-95e8-4013-84bb-68c59f28faea
dc.identifier.uri	http://hdl.handle.net/20.500.12627/38911
dc.identifier.uri	https://doi.org/10.1016/s0375-9601(96)00854-7
dc.description.abstract	A simple model of deposition is introduced in which a particle deposited on the surface sticks in its original position with probability alpha or diffuses with probability 1 - alpha. One dimensional monomer and dimer versions of this model are solved exactly and numerical simulations are performed on the two dimensional model. For the one dimensional monomer model, a higher order correlation function is calculated.
dc.language.iso	eng
dc.subject	Fizik
dc.subject	Temel Bilimler
dc.subject	FİZİK, MULTİDİSİPLİNER
dc.subject	Disiplinlerarası Fizik ve İlgili Bilim ve Teknoloji Alanları
dc.subject	Temel Bilimler (SCI)
dc.title	Statistical mechanics of a deposition-diffusion process
dc.type	Makale
dc.relation.journal	PHYSICS LETTERS A
dc.contributor.department	, ,
dc.identifier.volume	225
dc.identifier.startpage	239
dc.identifier.endpage	244
dc.contributor.firstauthorID	834726

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