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dc.contributor.authorÜrgen, Mustafa Kamil
dc.contributor.authorDemiroglu, D.
dc.contributor.authorTatar, Beyhan
dc.contributor.authorKazmanli, K.
dc.date.accessioned2022-02-18T08:58:19Z
dc.date.available2022-02-18T08:58:19Z
dc.identifier.citationDemiroglu D., Tatar B., Kazmanli K., Ürgen M. K. , "Investigation of Structural and Electrical Properties of Flat a-Si/c-Si Heterostructure Fabricated by EBPVD Technique", 3rd International Congress on Advances in Applied Physics and Materials Science, Antalya, Türkiye, 24 - 28 Nisan 2013, cilt.1569, ss.158-161
dc.identifier.othervv_1032021
dc.identifier.otherav_0d7c8580-3b3d-4fd4-ad47-339c47aa9522
dc.identifier.urihttp://hdl.handle.net/20.500.12627/176243
dc.identifier.urihttps://doi.org/10.1063/1.4849249
dc.description.abstractFlat amorphous silicon - crystal silicon (a-Si/c-Si) heterostructitre were prepared by ultra-high vacuum electron beam evaporation technique on p-Si (111) and n-Si (100) single crystal substrates. Structural analyses were investigated by XRD, Raman and FEG-SEM analysis. With these analyses we determined that at the least amorphous structure shows modification but amorphous structure just protected. The electrical and photovoltaic properties of flat a-Si/c-Si heterojunction devices were investigated with current-voltage characteristics under dark and illumination conditions. Electrical properties of flat a-Si/c-Si heterorojunction; such as barrier height Phi(B), diode ideality factor eta were determined from current-voltage characteristics in dark conditions. These a-Si/c-Si heterostructure have good rectification behavior as a diode and exhibit high photovoltaic sensitivity.
dc.language.isoeng
dc.subjectFİZİK, UYGULAMALI
dc.subjectMühendislik, Bilişim ve Teknoloji (ENG)
dc.subjectMalzeme Bilimi
dc.subjectMühendislik ve Teknoloji
dc.subjectTemel Bilimler
dc.subjectTemel Bilimler (SCI)
dc.subjectFizik
dc.subjectPhysical Sciences
dc.subjectGeneral Materials Science
dc.subjectStatistical and Nonlinear Physics
dc.subjectMaterials Chemistry
dc.subjectMetals and Alloys
dc.subjectMALZEME BİLİMİ, MULTIDISCIPLINARY
dc.titleInvestigation of Structural and Electrical Properties of Flat a-Si/c-Si Heterostructure Fabricated by EBPVD Technique
dc.typeBildiri
dc.contributor.departmentİstanbul Teknik Üniversitesi , ,
dc.identifier.volume1569
dc.contributor.firstauthorID3051027


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