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dc.contributor.authorBagci, Sadik
dc.contributor.authorDogruyol, Zekeriya
dc.contributor.authorSan, Sait Eren
dc.contributor.authorDemir, Ahmet
dc.date.accessioned2021-03-05T13:41:25Z
dc.date.available2021-03-05T13:41:25Z
dc.date.issued2015
dc.identifier.citationDemir A., Bagci S., San S. E. , Dogruyol Z., "PENTACENE-BASED ORGANIC THIN FILM TRANSISTOR WITH SiO2 GATE DIELECTRIC", SURFACE REVIEW AND LETTERS, cilt.22, 2015
dc.identifier.issn0218-625X
dc.identifier.othervv_1032021
dc.identifier.otherav_b36990fc-efce-426f-adb6-3fbbfe642143
dc.identifier.urihttp://hdl.handle.net/20.500.12627/119494
dc.identifier.urihttps://doi.org/10.1142/s0218625x15500389
dc.description.abstractAn organic thin film transistor (OTFT) based on pentacene was fabricated with SiO2 as the gate dielectric material. We have investigated the effects of the thickness of pentacene layer and the organic semiconductor (OSC) material on OTFT devices at two different thicknesses. Au metal was deposited for gate, source and drain contacts of the device by using thermal evaporation method. Pentacene thin film layer was also prepared with thermal evaporation. Our study has shown that the change in pentacene thickness makes a noteworthy difference on the field effect mobility (mu(FET)), values, threshold voltages (V-T) and on/off current ratios (I-on/I-off). OTFTs exhibited saturation at the order of mu(FET) of 3.92 cm(2)/Vs and 0.86 cm(2)/Vs at different thicknesses. I-on/I-off and V-T are also thickness dependent. I-on/I-off is 1 x 10(3), 2 x 10(2) and V-T is 15 V, 27 V of 40 nm and 60 nm, respectively. The optimized thickness of the pentacene layer was found as 40 nm. The effect of the OSC layer thickness on the OTFT performance was found to be conspicuous.
dc.language.isoeng
dc.subjectYoğun Madde 1:Yapısal, Mekanik ve Termal Özellikler
dc.subjectTemel Bilimler
dc.subjectFizikokimya
dc.subjectFizik
dc.subjectFİZİK, YOĞUN MADDE
dc.subjectTemel Bilimler (SCI)
dc.subjectKimya
dc.subjectKİMYA, FİZİKSEL
dc.titlePENTACENE-BASED ORGANIC THIN FILM TRANSISTOR WITH SiO2 GATE DIELECTRIC
dc.typeMakale
dc.relation.journalSURFACE REVIEW AND LETTERS
dc.contributor.departmentSakarya Üniversitesi , ,
dc.identifier.volume22
dc.identifier.issue3
dc.contributor.firstauthorID86466


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